NJbinglab PFA Liquid Handling System For Photolithography, Precision Control Of Developers And Rinsing Agents

Detalhes do produto

1. Superior Chemical Resistance - Withstands virtually all acids, bases and organic solvents, including HF, aqua regia and DMSO. 2. Exceptional Purity - Ultra-low metal leaching ensures contamination-free processing for sensitive applications. 3. Broad Temperature Range - Maintains structural integrity from -200 degrees Celsius to +260 degrees Celsius for extreme condition work. 4. Optical Clarity - Transparent walls allow visual monitoring of reactions and fluid levels. 5. Non-Reactive Surface - Prevents sample adhesion and enables easy cleaning, even with polymerizing materials. 6. Durable Construction - Excellent mechanical strength and fatigue resistance for long-term laboratory use.

Sobre o fornecedor

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